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Reverse replication of circular micro grating structures with soft lithography. / Shang, Xiaobing; Missinne, Jeroen; Beneitez, Nuria Teigell; Jablonski, Michal; De Smet, Jelle; Joshi, Pankaj; Cuypers, Dieter; Baghdasaryan, Tigran; Vervaeke, Michael; Thienpont, Hugo; De Smet, Herbert.

31st European Mask and Lithography Conference. ed. / Uwe F.W. Behringer; Jo Finders. Vol. 9661 SPIE, 2015. 96610V (Proceedings of SPIE; Vol. 9661).

Research output: Chapter in Book/Report/Conference proceedingConference paper

Harvard

Shang, X, Missinne, J, Beneitez, NT, Jablonski, M, De Smet, J, Joshi, P, Cuypers, D, Baghdasaryan, T, Vervaeke, M, Thienpont, H & De Smet, H 2015, Reverse replication of circular micro grating structures with soft lithography. in UFW Behringer & J Finders (eds), 31st European Mask and Lithography Conference. vol. 9661, 96610V, Proceedings of SPIE, vol. 9661, SPIE. https://doi.org/10.1117/12.2194351

APA

Shang, X., Missinne, J., Beneitez, N. T., Jablonski, M., De Smet, J., Joshi, P., ... De Smet, H. (2015). Reverse replication of circular micro grating structures with soft lithography. In U. F. W. Behringer, & J. Finders (Eds.), 31st European Mask and Lithography Conference (Vol. 9661). [96610V] (Proceedings of SPIE; Vol. 9661). SPIE. https://doi.org/10.1117/12.2194351

Vancouver

Shang X, Missinne J, Beneitez NT, Jablonski M, De Smet J, Joshi P et al. Reverse replication of circular micro grating structures with soft lithography. In Behringer UFW, Finders J, editors, 31st European Mask and Lithography Conference. Vol. 9661. SPIE. 2015. 96610V. (Proceedings of SPIE). https://doi.org/10.1117/12.2194351

Author

Shang, Xiaobing ; Missinne, Jeroen ; Beneitez, Nuria Teigell ; Jablonski, Michal ; De Smet, Jelle ; Joshi, Pankaj ; Cuypers, Dieter ; Baghdasaryan, Tigran ; Vervaeke, Michael ; Thienpont, Hugo ; De Smet, Herbert. / Reverse replication of circular micro grating structures with soft lithography. 31st European Mask and Lithography Conference. editor / Uwe F.W. Behringer ; Jo Finders. Vol. 9661 SPIE, 2015. (Proceedings of SPIE).

BibTeX

@inproceedings{dbcdaa5c44cf497bb95c239bd6b15fc7,
title = "Reverse replication of circular micro grating structures with soft lithography",
abstract = "In this work, the reverse replication of circular micro grating structures on glass substrates is implemented using an ultra-violet curable resin and a polydimethylsiloxane (PDMS) mold which has the same structure as the original circular grating master. Two different techniques ({"}double PDMS replication{"} and {"}polymer-PDMS replication{"}) are employed to fabricate those reversed circular micro grating structures. Surface profiling measurements show that in case of the polymer-PDMS replication the dimensions of the resulting circular grating structures closely approximate those of the master, while the grating height is slightly decreased in case of the double PDMS replication technique, mainly due to the use of the releasing agent. For both methods, the grating slopes of the circular gratings are almost unchanged, leading to the desired optical performance. The two techniques are quite useful for more accurate reverse replications of micro optical and photonic structures.",
keywords = "soft lithography, reverse replication, UV curable resins, PDMS molding, light steering",
author = "Xiaobing Shang and Jeroen Missinne and Beneitez, {Nuria Teigell} and Michal Jablonski and {De Smet}, Jelle and Pankaj Joshi and Dieter Cuypers and Tigran Baghdasaryan and Michael Vervaeke and Hugo Thienpont and {De Smet}, Herbert",
year = "2015",
doi = "10.1117/12.2194351",
language = "English",
isbn = "9781628418798",
volume = "9661",
series = "Proceedings of SPIE",
publisher = "SPIE",
editor = "Behringer, {Uwe F.W.} and Jo Finders",
booktitle = "31st European Mask and Lithography Conference",
address = "United States",

}

RIS

TY - GEN

T1 - Reverse replication of circular micro grating structures with soft lithography

AU - Shang, Xiaobing

AU - Missinne, Jeroen

AU - Beneitez, Nuria Teigell

AU - Jablonski, Michal

AU - De Smet, Jelle

AU - Joshi, Pankaj

AU - Cuypers, Dieter

AU - Baghdasaryan, Tigran

AU - Vervaeke, Michael

AU - Thienpont, Hugo

AU - De Smet, Herbert

PY - 2015

Y1 - 2015

N2 - In this work, the reverse replication of circular micro grating structures on glass substrates is implemented using an ultra-violet curable resin and a polydimethylsiloxane (PDMS) mold which has the same structure as the original circular grating master. Two different techniques ("double PDMS replication" and "polymer-PDMS replication") are employed to fabricate those reversed circular micro grating structures. Surface profiling measurements show that in case of the polymer-PDMS replication the dimensions of the resulting circular grating structures closely approximate those of the master, while the grating height is slightly decreased in case of the double PDMS replication technique, mainly due to the use of the releasing agent. For both methods, the grating slopes of the circular gratings are almost unchanged, leading to the desired optical performance. The two techniques are quite useful for more accurate reverse replications of micro optical and photonic structures.

AB - In this work, the reverse replication of circular micro grating structures on glass substrates is implemented using an ultra-violet curable resin and a polydimethylsiloxane (PDMS) mold which has the same structure as the original circular grating master. Two different techniques ("double PDMS replication" and "polymer-PDMS replication") are employed to fabricate those reversed circular micro grating structures. Surface profiling measurements show that in case of the polymer-PDMS replication the dimensions of the resulting circular grating structures closely approximate those of the master, while the grating height is slightly decreased in case of the double PDMS replication technique, mainly due to the use of the releasing agent. For both methods, the grating slopes of the circular gratings are almost unchanged, leading to the desired optical performance. The two techniques are quite useful for more accurate reverse replications of micro optical and photonic structures.

KW - soft lithography

KW - reverse replication

KW - UV curable resins

KW - PDMS molding

KW - light steering

U2 - 10.1117/12.2194351

DO - 10.1117/12.2194351

M3 - Conference paper

SN - 9781628418798

VL - 9661

T3 - Proceedings of SPIE

BT - 31st European Mask and Lithography Conference

A2 - Behringer, Uwe F.W.

A2 - Finders, Jo

PB - SPIE

ER -

ID: 18730898