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@article{c23b7b7fde5a45639c6514a89411e534,
title = "Exploration and mechanism analysis: The maximum ultraviolet luminescence limits of ZnO/few-layer graphene composite films",
abstract = "In this paper, ZnO films were deposited on the surface of few-layer graphene films by RF magnetron sputtering and its photoluminescence performance was studied. Large-area few-layer graphene films were prepared on a Cu substrate by CVD. To improve the crystalline quality and c-axis preferred growth orientation of ZnO films, we systematically optimized the process parameters (RF power, working pressure, substrate temperature, the flow ratio of Ar and O2) of growing ZnO on graphene films. After optimizing the growth process of ZnO on the graphene surface, the enhancement effect of graphene film on the PL properties of the ZnO layer was studied. We explored the influence of ZnO thickness on the PL performance. On the one hand, the optimal process parameters of growing ZnO on the surface of graphene films by magnetron sputtering were investigated; on the other hand, the sputtering time was optimized to make the composite films have the strongest UV emission performance with the lowest visible range.",
keywords = "Chemical vapor deposition, Photoluminescence, Sputtering, Composite films",
author = "Chen Cheng and Johan Stiens and Tom Hauffman and Sven Pletincx and Revilla, {Reynier I.}",
year = "2020",
month = "2",
day = "15",
doi = "https://doi.org/10.1016/j.apsusc.2019.144169",
language = "English",
volume = "503",
pages = "1--9",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Exploration and mechanism analysis: The maximum ultraviolet luminescence limits of ZnO/few-layer graphene composite films

AU - Cheng, Chen

AU - Stiens, Johan

AU - Hauffman, Tom

AU - Pletincx, Sven

AU - Revilla, Reynier I.

PY - 2020/2/15

Y1 - 2020/2/15

N2 - In this paper, ZnO films were deposited on the surface of few-layer graphene films by RF magnetron sputtering and its photoluminescence performance was studied. Large-area few-layer graphene films were prepared on a Cu substrate by CVD. To improve the crystalline quality and c-axis preferred growth orientation of ZnO films, we systematically optimized the process parameters (RF power, working pressure, substrate temperature, the flow ratio of Ar and O2) of growing ZnO on graphene films. After optimizing the growth process of ZnO on the graphene surface, the enhancement effect of graphene film on the PL properties of the ZnO layer was studied. We explored the influence of ZnO thickness on the PL performance. On the one hand, the optimal process parameters of growing ZnO on the surface of graphene films by magnetron sputtering were investigated; on the other hand, the sputtering time was optimized to make the composite films have the strongest UV emission performance with the lowest visible range.

AB - In this paper, ZnO films were deposited on the surface of few-layer graphene films by RF magnetron sputtering and its photoluminescence performance was studied. Large-area few-layer graphene films were prepared on a Cu substrate by CVD. To improve the crystalline quality and c-axis preferred growth orientation of ZnO films, we systematically optimized the process parameters (RF power, working pressure, substrate temperature, the flow ratio of Ar and O2) of growing ZnO on graphene films. After optimizing the growth process of ZnO on the graphene surface, the enhancement effect of graphene film on the PL properties of the ZnO layer was studied. We explored the influence of ZnO thickness on the PL performance. On the one hand, the optimal process parameters of growing ZnO on the surface of graphene films by magnetron sputtering were investigated; on the other hand, the sputtering time was optimized to make the composite films have the strongest UV emission performance with the lowest visible range.

KW - Chemical vapor deposition

KW - Photoluminescence

KW - Sputtering

KW - Composite films

UR - http://www.scopus.com/inward/record.url?scp=85074772306&partnerID=8YFLogxK

U2 - https://doi.org/10.1016/j.apsusc.2019.144169

DO - https://doi.org/10.1016/j.apsusc.2019.144169

M3 - Article

VL - 503

SP - 1

EP - 9

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

M1 - 144169

ER -

ID: 49076523